SiC Sputtering Targets

Cat No:SBM-PSM-0014

Description

These SiC targets are suited to vacuum coating systems that require a refractory ceramic source, offering a practical route to thin films valued for hardness, thermal endurance, electrical functionality, and resistance to chemically aggressive environments.

Datasheet

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Basic Information

Material Type	Silicon Carbide
Molecular Formula	SiC
Purity	99.5%
Appearance	Solid
Z Ratio	1.00
Size	Ø25.4 mm × 6.35 mm Thick
Melting Point	~2700°C
Theoretical Density (g/cm³)	3.22
Sputter	RF
Maximum Power Density (W/in²)	30
Type of Bond	Indium, elastomer
Comments	Sputtering preferred.
Transport Information	Transport classification depends on form
Packaging Specification	Bulk: plastic pails, fiber/steel drums, super sacks

Applications

Vacuum Coating: Serves as a source for dense carbide layers. Sensor Platforms: Helps form durable functional films on microscale devices. High-Temperature Components: Adds protective surfaces where thermal stability matters. Academic Laboratories: Supports exploratory deposition and characterization work.

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Eata Silicon delivers a diverse portfolio of silicon-based materials, from high-purity silicon and inorganic silicon compounds to functional silicon materials and customized solutions, supporting research, manufacturing, and next-generation applications across multiple industries.

For Research or Industrial Raw Materials, Not For Personal Medical Use!